Aviza Technology Limited

Trikon Holdings Limited

Trikon Equipments Limited

Spp Process Technology Systems UK Limited

Kevin Powell

David Andrew Tossell

Nicholas John Appleyard

Matthew Peter Martin

Mark Puttock

Mark Stephen Puttock

Graham Richard Powell

Alan Victor Iacopi

This invention relates to a method of processing substrates including: (a) etching, in a chamber, a generally vertical structure in a substrate using a cyclic process including an etch step using a reactive etch gas and a deposition step for depositing a protective polymer on to the side walls of that part of the structure which has already been etched by a preceding etch step or steps; and (b) cleaning, in the absence of any substrate, the chamber of material deposited thereon by the performance of the deposition step in step (a) characterized in that following the cleaning of the deposition derived material, the chamber is cleaned of material derived from the etchant gas by exposing the chamber to a plasma containing a mixture of Oand at least the active element of elements of the etchant gas.

Method of processing substrates

This invention relates to a method of etching a substrate in a chamber on an electrostatic chuck, which defines a gas cooling path at the substrate/chuck interface. The method includes electrostatically clamping the substrate on the chuck with gas in the gas path being at a first pressure; etching the substrate at a first power; detecting the end point for the etc; reducing the gas pressure to a second pressure at which the substrate floats on a gas; and over etching the wafer at a second power, which is lower than the first power.

Method of etching a substrate

An electrostatic chuck,for a plasma reactor apparatus,comprises a base metallic section,, a pair of electrodes,set in bonding material,and electrically insulated from the base by a plate,and a thick dielectric layer,(e.g. 0.5 to 1.5 mm), which covers the electrodes,and bonding material,and forms the support surfaces for wafers

Electrostatic chucks

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Bristol, United Kingdom

Kevin Powell