Kevin J Ryan

Title: Kevin J. Ryan: Innovator in Semiconductor Technology from Albany, NY

Introduction

Kevin J. Ryan, an accomplished inventor based in Albany, NY, has made significant contributions to the field of semiconductor technology. With two patents under his belt, his work focuses on enhancing integrated circuit (IC) structures, which are critical in modern electronic devices.

Latest Patents

Kevin's most recent patents include:

1. **IC Structure with Metal Cap on Cobalt Layer and Methods of Forming Same** - This innovative patent discloses methods for constructing IC structures featuring a metal cap on a cobalt layer, specifically for the source and drain regions of transistors. The patented IC structure incorporates a semiconductor fin on a substrate, along with a gate structure and an insulator cap, enhancing the overall performance and reliability of transistors in integrated circuits.

2. **Method of Cleaning Semiconductor Device** - This patent outlines a method for cleaning semiconductor devices that includes the use of cathode water to rinse an exposed cobalt surface, ensuring optimal cleanliness and performance of the semiconductor wafer.

Career Highlights

Kevin J. Ryan is currently employed at GlobalFoundries Inc., a renowned company in the semiconductor fabrication industry. His inventive prowess is reflected in his patents that hold significant potential for improving manufacturing processes and device efficiency.

Collaborations

During his career, Kevin has worked closely with talented colleagues, including Shariq Siddiqui and Frank Wilhelm Mont. Their collaborations have played a pivotal role in developing innovative solutions and advancing semiconductor technologies.

Conclusion

With a focus on creating and patenting cutting-edge semiconductor technologies, Kevin J. Ryan stands out as an inventor dedicated to innovation. His latest contributions not only enhance the functionality of integrated circuits but also pave the way for future advancements in the semiconductor industry.