The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10062560 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 28, 2018

Filed:

Apr. 26, 2017
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Kevin J. Ryan, Albany, NY (US);

Shariq Siddiqui, Albany, NY (US);

Frank W. Mont, Troy, NY (US);

Cornelius B. Peethala, Albany, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/02 (2006.01); C25F 1/00 (2006.01); H01L 21/768 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02068 (2013.01); C25F 1/00 (2013.01); H01L 21/0274 (2013.01); H01L 21/76877 (2013.01);
Abstract

Aspects of the present disclosure provide a method of cleaning a semiconductor device. The method includes providing a semiconductor wafer having an exposed cobalt surface and rinsing the exposed cobalt surface with cathode water having a pH greater than 9 and an oxidation reduction potential of less than 0.0.


Find Patent Forward Citations

Ryan, Kevin. (2018). Method of cleaning semiconductor device (U.S. Patent No. 10062560). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10062560

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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