Kevin Chang

Title: Kevin Chang - Innovator in Semiconductor Technology

Introduction

Kevin Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Kevin Chang holds a patent for a "Metal gate structure and method of forming the same." This patent outlines a method of manufacturing a semiconductor device that includes several intricate steps. These steps involve forming a gate trench over a semiconductor substrate, depositing a gate dielectric layer and a work function layer in the gate trench, and depositing a capping layer over the work function layer. The process also includes passivating a surface portion of the capping layer to form a passivation layer, removing the passivation layer, depositing a fill layer in the gate trench, recessing the fill layer and the capping layer, and finally forming a contact metal layer above the capping layer in the gate trench. This innovative approach enhances the efficiency and performance of semiconductor devices.

Career Highlights

Kevin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to further develop his skills and contribute to groundbreaking advancements in technology.

Collaborations

Throughout his career, Kevin has collaborated with talented individuals such as Tsung-Han Shen and Yu-Ming Li. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kevin Chang is a notable inventor whose work in semiconductor technology has led to significant advancements in the field. His patent and contributions reflect his dedication to innovation and excellence in technology.