This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2012-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2016
Title: Keun-Hwan Park: Innovator in Megasonic Cleaning Technology
Introduction
Keun-Hwan Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of cleaning technologies, particularly through his innovative methods involving megasonic cleaning. With a total of 2 patents to his name, Park continues to push the boundaries of what is possible in this area.
Latest Patents
One of Park's latest patents is a method of megasonic cleaning of an object. This invention provides a megasonic cleaning method and apparatus that utilizes microcavitation bubbles. These bubbles are formed by applying an electromotive force to a cleaning solution using megasonic energy in a separate room from the object to be cleaned. The microcavitation bubbles, which exhibit stable oscillation, are then moved to the object, effectively cleaning its surface. This method allows for the removal of particles attached to the object's surface while preventing any damage to its patterns.
Career Highlights
Keun-Hwan Park is currently employed at Samsung Electronics Co., Ltd., where he continues to develop and refine his innovative cleaning technologies. His work has garnered attention for its practical applications in various industries, enhancing the efficiency and effectiveness of cleaning processes.
Collaborations
Throughout his career, Park has collaborated with talented individuals such as Jae-Hyuck Choi and Won-Jung Kim. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Keun-Hwan Park is a distinguished inventor whose work in megasonic cleaning technology has made a significant impact. His innovative methods and collaborations highlight his commitment to advancing cleaning technologies. As he continues to develop new solutions, Park's contributions will undoubtedly shape the future of this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
