Samsung Electronics Co., Ltd.

Keun-Hwan Park

Ho-Young Kim

Jae-Hyuck Choi

Hyung-ho Ko

Chan-Uk Jeon

Jong-Keun Oh

Won-Jung Kim

A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

Growing community of inventors

Seoul, South Korea

Keun-Hwan Park