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For the Inventor, By the Inventor

Hillsboro, OR, United States of America

Kerry L Spurgin

This inventor holds 5 USPTO granted patents. Top assignee: Intel Corporation. Active years: 1994-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kerry L Spurgin. Retrieved from https://idiyas.com/inventor/kerry-l-spurgin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 60.0

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Hillsboro, OR (US) (1994 - 2000)
  • Portland, OR (US) (2009)

Company Filing History:

goldMedal5 out of 56,394 
 
Intel Corporation
 patents

Years Active: 1994-2009

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5 patents (USPTO):Explore Patents
1. 7605469 - Atomic layer deposited tantalum containing adhesion layer (2009-10-20),
2. 7601637 - Atomic layer deposited tantalum containing adhesion layer (2009-10-13),
3. 6118168 - Trench isolation process using nitrogen preconditioning to reduce (2000-09-12),
4. 5985735 - Trench isolation process using nitrogen preconditioning to reduce (1999-11-16),
5. 5358891 - Trench isolation with planar topography and method of fabrication (1994-10-25),

Title: The Innovations of Kerry L Spurgin

Introduction

Kerry L Spurgin is a notable inventor based in Hillsboro, OR (US). She has made significant contributions to the field of technology, particularly in the area of atomic layer deposition. With a total of five patents to her name, her work has had a considerable impact on the industry.

Latest Patents

Among her latest patents is the "Atomic layer deposited tantalum containing adhesion layer." This invention focuses on apparatus and methods for fabricating an atomic layer deposited tantalum containing adhesion layer within at least one dielectric material in the formation of a metal. The design ensures that the atomic layer deposition tantalum containing adhesion layer is sufficiently thin to minimize contact resistance and maximize the total cross-sectional area of metal, including but not limited to tungsten, within the contact.

Career Highlights

Kerry L Spurgin is currently employed at Intel Corporation, where she continues to innovate and develop new technologies. Her expertise in atomic layer deposition has positioned her as a key player in her field.

Collaborations

Throughout her career, Kerry has collaborated with notable colleagues such as Peter K Moon and David T Krick. These partnerships have further enhanced her contributions to the field.

Conclusion

Kerry L Spurgin's work exemplifies the spirit of innovation and dedication in technology. Her patents and collaborations reflect her commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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