Koshi, Japan

Kenzi Yada


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kenzi Yada: Innovator in Substrate Liquid Treatment Technology

Introduction

Kenzi Yada is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate liquid treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of wafer processing.

Latest Patents

Kenzi Yada holds a patent for a substrate liquid treatment apparatus and method. This apparatus features a chuck that securely holds and rotates a wafer. It includes a back surface purging nozzle that discharges a purge gas toward the back surface of the wafer. Additionally, a periphery purging nozzle is designed to discharge the purge gas onto the back surface of the wafer. The back surface purging nozzle has a slit-like opening that extends from the central side to the peripheral side of the substrate. The vertical distance between this opening and the substrate increases as it approaches the end of the opening on the central side. The periphery purging nozzle directs the purge gas toward a central part of the substrate, specifically to a region located radially outside the end of the slit-like opening.

Career Highlights

Kenzi Yada is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on improving substrate treatment processes, which are crucial for the manufacturing of semiconductor devices. His innovative solutions have contributed to advancements in the efficiency and effectiveness of wafer processing.

Collaborations

Kenzi Yada has collaborated with notable colleagues, including Masahiro Fukuda and Akihiro Kubo. Their combined expertise has fostered a productive environment for innovation and development within their field.

Conclusion

Kenzi Yada's contributions to substrate liquid treatment technology exemplify the impact of innovation in the semiconductor industry. His patent and collaborative efforts highlight the importance of teamwork in advancing technological solutions.

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