This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kento Araki: Innovator in Substrate Processing Technology
Introduction
Kento Araki is a notable inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique substrate processing apparatus that enhances the efficiency of substrate handling.
Latest Patents
Kento Araki holds a patent for a "Substrate processing apparatus and substrate processing method." This invention involves a substrate processing apparatus designed to process a combined substrate, which consists of a first substrate and a second substrate stacked together. The apparatus features a substrate holder to hold the combined substrate, a laser radiating unit that emits laser light in a pulse shape, a moving mechanism to facilitate relative movement between the substrate holder and the laser radiating unit, and a controller that manages the operation of both the laser radiating unit and the moving mechanism. The controller is capable of selecting the position of a separation surface between the two substrates based on the thickness of the laser absorbing film.
Career Highlights
Kento Araki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to apply his innovative ideas in practical applications, contributing to advancements in substrate processing technology.
Collaborations
Kento has collaborated with talented coworkers such as Hayato Tanoue and Gousuke Shiraishi. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Kento Araki's contributions to substrate processing technology exemplify the impact of innovation in the field. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing substrate processing methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
