Miyagi, Japan

Kentarou Fujita

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kentarou Fujita. Retrieved from https://idiyas.com/inventor/kentarou-fujita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Kentarou Fujita: Innovator in Processing Methods

Introduction

Kentarou Fujita is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of processing methods, particularly in the semiconductor industry. His innovative approach has led to the development of a unique patent that enhances the efficiency of workpiece processing.

Latest Patents

Kentarou Fujita holds a patent for a processing method that involves etching a first nitrified region of a workpiece. This method is particularly relevant for silicon-based materials. The process includes the formation of a silicon oxide film and isotropic etching of the nitrified region, which is crucial for improving the quality of semiconductor devices. He has 1 patent to his name.

Career Highlights

Fujita is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Kentarou Fujita has collaborated with talented coworkers such as Yusuke Takino and Yusuke Yanagisawa. Their teamwork has fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Kentarou Fujita's contributions to processing methods in the semiconductor industry highlight his role as an influential inventor. His patent and collaborative efforts continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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