Chiba, Japan

Kentaro Nagai



Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Chiba, JP (2019)
  • Toyama, JP (2019)

Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: **Kentaro Nagai: Innovator in Polysilane Technologies**

Introduction

Kentaro Nagai is a prominent inventor based in Chiba, Japan, recognized for his contributions to the field of polysilane technologies. With a total of two patents to his name, Nagai has significantly advanced the use of high-molecular-weight polysilanes in the production of silicon thin films, which are critical in various electronic applications.

Latest Patents

Kentaro Nagai's most recent patents focus on innovative methods for producing highly conductive silicon thin films. His first patent, titled "High-molecular-weight polysilane and method for producing same," describes a polysilane composition designed to create a superior silicon thin film by applying it to a substrate and subsequently baking it at temperatures ranging from 100°C to 425°C. This process involves the use of a polysilane with a weight average molecular weight of 5,000 to 8,000, emphasizing the polymerization of cyclopentasilane in the presence of a palladium catalyst that is supported on a polymer.

His second patent, "Method for producing cyclic silane using concentration method," details a process for synthesizing cyclic silanes with high purity. This patent outlines the reaction between a cyclic silane compound and a hydrogen halide in the presence of an aluminum halide, followed by distillation and reduction of the resultant cyclic silane.

Career Highlights

Nagai has been employed at Thin Film Electronics ASA, where he has applied his innovative ideas to push the boundaries of silicon thin film technology. His work has resulted in advancements that enhance the conductivity and efficiency of semiconductor devices, contributing to the evolution of smart electronics.

Collaborations

Throughout his career, Kentaro Nagai has collaborated with esteemed colleagues, including Yuichi Goto and Masahisa Endo. These professional relationships have fostered a conducive environment for sharing ideas and expediting research within the field of materials science.

Conclusion

Kentaro Nagai's impressive track record as an inventor in the domain of polysilane technologies highlights his impact on the semiconductor industry. With his innovative patents and collaborations, Nagai continues to pave the way for future advancements in silicon-based electrical components.

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