Kyotanabe, Japan

Kentaro Murakawa

This inventor holds 1 USPTO granted patent. Top assignee: Kyocera Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kentaro Murakawa. Retrieved from https://idiyas.com/inventor/kentaro-murakawa-4ept9k6p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kentaro Murakawa: Innovator in Semiconductor Manufacturing

Introduction

Kentaro Murakawa is a prominent inventor based in Kyotanabe, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor elements.

Latest Patents

Kentaro Murakawa holds 1 patent for a method of manufacturing a semiconductor element. This patent describes a process that includes several steps: an element forming step, a preparing step, a bonding step, and a peeling step. The method involves forming a semiconductor element on an underlying substrate and bonding it to a support substrate, which can lead to advancements in semiconductor technology.

Career Highlights

Kentaro Murakawa is associated with Kyocera Corporation, a leading company in the electronics industry. His work at Kyocera has allowed him to focus on innovative solutions in semiconductor manufacturing. His expertise and dedication have contributed to the company's reputation for quality and innovation.

Collaborations

Kentaro has collaborated with Katsuaki Masaki, a fellow innovator in the field. Their partnership has fostered the development of new technologies and methodologies in semiconductor manufacturing.

Conclusion

Kentaro Murakawa's contributions to semiconductor manufacturing exemplify the spirit of innovation. His patent and work at Kyocera Corporation highlight the importance of advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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