Los Gatos, CA, United States of America

Kenneth P MacWilliams

This inventor holds 2 USPTO granted patents. Top assignee: Novellus Systems Incorporated. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenneth P MacWilliams. Retrieved from https://idiyas.com/inventor/kenneth-p-macwilliams-zvk3cigl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Kenneth P. MacWilliams

Introduction

Kenneth P. MacWilliams, an esteemed inventor based in Los Gatos, California, has made significant strides in the field of semiconductor technology. With a total of two patents to his name, MacWilliams has demonstrated a commitment to enhancing the efficiency and functionality of semiconductor materials through innovative research and development.

Latest Patents

MacWilliams' latest patents showcase his expertise and contributions to the semiconductor field. One of his notable inventions is the "Low dielectric constant etch stop films," which involves an amorphous material made up of silicon, carbon, hydrogen, and nitrogen. This material serves as a barrier/etch stop layer designed for low dielectric constant insulating layers and copper interconnects. It is particularly noteworthy for its impressive properties, including a dielectric constant of less than 4.5, an electrical breakdown field of about 5 MV/cm, and a low leakage current. The amorphous material is fabricated using plasma-assisted chemical vapor deposition of alklysilanes together with nitrogen and ammonia, making it suitable for standard damascene fabrication processes.

Another significant patent pertains to "Semiconductor processing using antireflective layer having high wet etch rate." This invention involves an antireflective layer made of silicon nitride, fabricated through a plasma-enhanced chemical vapor deposition process. By manipulating the process temperature and the gaseous ratio, MacWilliams has succeeded in achieving desirable refractive index values and extinction coefficients. This innovation enables rapid etching of the silicon nitride layer, allowing for quick removal and minimizing damage to underlying structures in semiconductor devices.

Career Highlights

Kenneth P. MacWilliams works with Novellus Systems Incorporated, a company recognized for its leading role in semiconductor manufacturing and technology. His impressive advancements and innovations within the company underscore his expertise in the semiconductor domain.

Collaborations

Throughout his career, MacWilliams has collaborated with noteworthy colleagues such as Sanjeev Jain and Somnath S. Nag. These collaborative efforts have undoubtedly enhanced the innovation landscape in which they operate, leading to significant advances in semiconductor processing and materials.

Conclusion

Kenneth P. MacWilliams stands out as a prominent inventor whose contributions to semiconductor technology have shaped the industry. Through his innovative patents and collaborations, he has played an essential role in enhancing semiconductor materials and processes, ensuring a brighter future for technological advancement. His work continues to inspire many in the field of innovations and inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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