Tokyo, Japan

Kenji Yoshikawa

USPTO Granted Patents = 20 


 

Average Co-Inventor Count = 2.7

ph-index = 9

Forward Citations = 272(Granted Patents)


Location History:

  • Wako, JP (1998 - 2002)
  • Kanagawa-ken, JP (2016)
  • Shinagawa-ku, JP (2015 - 2017)
  • Tokyo, JP (2004 - 2024)
  • Chuo-ku, JP (2022 - 2024)

Company Filing History:


Years Active: 1998-2024

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20 patents (USPTO):Explore Patents

Kenji Yoshikawa: Pioneering Inventor from Tokyo, Japan

Introduction:

Kenji Yoshikawa is a distinguished inventor hailing from Tokyo, Japan, with a remarkable portfolio of 18 patents to his name. His groundbreaking work in the fields of semiconductor manufacturing and pharmaceuticals has significantly contributed to technological advancements globally.

Latest Patents:

1. Method for manufacturing semiconductor devices: Yoshikawa's innovative method involves forming semiconductor devices in one region of a wafer and cleave initiation portions in another, enhancing yield and manufacturing efficiency.

2. Cycloalkane-1,3-diamine derivative: This patent introduces a compound with an inhibitory action on the interaction between menin and an MLL protein, holding potential in the field of pharmaceuticals.

Career Highlights:

Yoshikawa's professional journey includes stints at renowned companies such as Honda Motor Co., Ltd. and Daiichi Pharmaceutical Co., Ltd.. His expertise and ingenuity have been instrumental in driving forward technological progress in both the automotive and pharmaceutical sectors.

Collaborations:

Throughout his career, Kenji Yoshikawa has collaborated with notable colleagues, including Noriyasu Haginoya and Toshiharu Yoshino. Together, they have spearheaded innovative projects and research initiatives, showcasing the power of teamwork in fostering creativity and breakthrough inventions.

Conclusion:

In summary, Kenji Yoshikawa stands out as a prolific inventor whose contributions to semiconductor manufacturing and pharmaceutical research have left a lasting impact on the industry. His dedication to pushing the boundaries of innovation continues to inspire future generations of inventors worldwide.

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