Yokkaichi, Japan

Kenichi Watabe

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Mitsubishi Materials Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Watabe. Retrieved from https://idiyas.com/inventor/kenichi-watabe-657lq6e2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Kenichi Watabe: Innovator in Polycrystalline Silicon Production

Introduction

Kenichi Watabe is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of materials science, particularly in the production of polycrystalline silicon. His innovative methods have the potential to enhance the efficiency and quality of silicon production processes.

Latest Patents

Watabe holds a patent for a method of refining carbon parts for the production of polycrystalline silicon. This method involves several steps, including replacing the inside gas of a reactor with an inert gas, drying the carbon parts by raising the temperature in the reactor, and flowing chlorine gas through the reactor to achieve purification. The process also includes maintaining reduced pressure within the reactor and pressurizing it with chlorine gas before cooling.

Career Highlights

Kenichi Watabe is associated with Mitsubishi Materials Corporation, where he applies his expertise in materials engineering. His work focuses on improving production techniques and developing innovative solutions for the semiconductor industry.

Collaborations

Watabe collaborates with Mitsutoshi Narukawa, contributing to advancements in their field through shared knowledge and expertise.

Conclusion

Kenichi Watabe's contributions to the production of polycrystalline silicon through his patented methods highlight his role as an innovator in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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