This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Kenichi Ueda: Innovator in Hydrophobization Technology
Introduction
Kenichi Ueda is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of hydrophobization technology, holding a total of 3 patents. His work focuses on innovative methods and apparatuses that enhance the treatment of substrates.
Latest Patents
Ueda's latest patents include a hydrophobization treatment apparatus, a hydrophobization treatment method, and a hydrophobization treatment recording medium. The hydrophobization treatment apparatus features a cooling device that cools a substrate, a light irradiation device that emits thermal radiation light onto the substrate's front surface, and a gas supply device that delivers hydrophobization-treatment gas. Additionally, it includes an exhaust device for gas removal, a lifting device for substrate movement, and a control device that manages the operation of these components. The control device's circuitry executes a two-step gas supply control process to optimize the treatment.
The substrate processing method involves a coating step that applies a coating liquid to a substrate, followed by a film removing step that gasifies components of the coating film to reduce its thickness. A film curing step is performed to ensure the coating film is properly cured through a crosslinking reaction, maintaining an average thickness that does not exceed 80% of the original coating film.
Career Highlights
Kenichi Ueda is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative technologies.
Collaborations
Ueda collaborates with talented coworkers, including Takahiro Shiozawa and Yuichiro Miyata, who contribute to his projects and enhance the overall innovation process.
Conclusion
Kenichi Ueda's contributions to hydrophobization technology demonstrate his commitment to advancing substrate treatment methods. His innovative patents and work at Tokyo Electron Limited highlight his role as a key figure in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile