Kawasaki, Japan

Kenichi Otsuka


Average Co-Inventor Count = 2.4

ph-index = 4

Forward Citations = 37(Granted Patents)


Location History:

  • Kawasaki, JP (1996 - 1999)
  • Kawaski, JP (2001)
  • Kanagawa, JP (2010)

Company Filing History:


Years Active: 1996-2010

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8 patents (USPTO):Explore Patents

Title: Kenichi Otsuka: Innovator in Semiconductor Technology

Introduction

Kenichi Otsuka is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative approaches have advanced the manufacturing processes of semiconductor devices.

Latest Patents

Otsuka's latest patents include a method of fabricating a semiconductor device. This method involves forming an interlayer sacrificial film and an insulating film above a semiconductor substrate. The process includes etching the insulating film to create a trench, forming a gas permeable film, and removing the interlayer sacrificial film through the trench. Another notable patent is an apparatus and method for manufacturing a semiconductor device with a multi-wiring layer structure. This invention utilizes a high vacuum environment to transfer a silicon wafer and employs a plasma CVD method for forming a TiSi film, ensuring high-quality results even in contact holes with large aspect ratios.

Career Highlights

Kenichi Otsuka is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work has been instrumental in enhancing semiconductor fabrication techniques, contributing to the company's reputation for innovation and quality.

Collaborations

Otsuka has collaborated with notable coworkers, including Kazuya Mori and Mari Otsuka. Their combined expertise has fostered advancements in semiconductor technology and manufacturing processes.

Conclusion

Kenichi Otsuka's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.

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