Kenichi Ishiguro

Title: Kenichi Ishiguro: Innovator in Semiconductor Processing

Introduction

Kenichi Ishiguro is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on innovative methods and apparatuses that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Ishiguro's latest patents include a cleaning method, a method of manufacturing semiconductor devices, and a substrate processing apparatus. The cleaning method involves a technique that removes substances adhering to the interior of a process container by performing a cycle a predetermined number of times under a first temperature. This cycle includes supplying a nitrogen- and hydrogen-containing gas along with a fluorine-containing gas into the process container after substrate processing. Additionally, the substrate processing apparatus he developed comprises a process chamber for processing substrates, a heater for heating the chamber's interior, and a holder for sustaining the substrate during processing.

Career Highlights

Throughout his career, Kenichi Ishiguro has worked with prominent companies such as Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Ishiguro has collaborated with notable colleagues, including Naoto Nakamura and Iwao Nakamura. Their joint efforts have further propelled innovations in the semiconductor industry.

Conclusion

Kenichi Ishiguro's contributions to semiconductor processing through his patents and career achievements highlight his role as a key innovator in the field. His work continues to influence advancements in technology and manufacturing processes.