Ken Wu

Title: Ken Wu: Innovator in Semiconductor Technology

Introduction

Ken Wu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing the methods and apparatus used in chemical mechanical polishing and semiconductor structure formation.

Latest Patents

Ken Wu's latest patents include a chemical mechanical polishing (CMP) apparatus and method. This innovative apparatus features a polishing zone with a wafer entrance and exit, a first wafer platform, a polishing module, a slurry injection module, a polishing cleaning module, and a film-thickness measuring module. The first wafer platform is designed to move from the wafer entrance to the wafer exit along a specified direction. The polishing module includes a polishing belt that operates in a direction perpendicular to the first direction. The slurry injection module is responsible for injecting slurry towards the wafer to be polished, while the polishing cleaning module cleans the wafer. Additionally, the film-thickness measuring module measures the thickness of the wafer.

Another notable patent is a method of forming a double pattern in a semiconductor structure. This method involves creating a negative photoresist layer on top of a positive photoresist layer over a substrate. An exposure process is conducted to form exposure regions in both layers, followed by a negative-tone development process to create openings. The positive photoresist layer is then etched to form additional openings, resulting in a double patterned positive photoresist layer.

Career Highlights

Ken Wu has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International (Shanghai) Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Ken has collaborated with notable professionals in the field, including Daniel Hu and Yiming Gu. These collaborations have further enhanced his work and contributed to the advancement of semiconductor technologies.

Conclusion

Ken Wu is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His innovative patents and collaborations with industry professionals highlight his commitment to pushing the boundaries of technology.