This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Intel Corporation. Active years: 2002-2003.
Company Filing History:
Years Active: 2002-2003
Title: Ken Schatz: Innovator in Sputter Etch Technology
Introduction
Ken Schatz is a notable inventor based in Palo Alto, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly in sputter etch technology. With a total of 2 patents, his work has had a considerable impact on the industry.
Latest Patents
Ken Schatz's latest patents include an innovative approach to optimizing an ILD argon sputter process. This patent describes a sputter etch system that features an etch chamber with a wafer pedestal designed to support a wafer. The system also incorporates a magnet that provides a continuous magnetic field directed at the top surface of the wafer pedestal. Another significant patent focuses on passivation for tight metal geometry. This method involves providing an integrated circuit with a top side that includes a bond pad, depositing a first dielectric over the top side, and ensuring that the second dielectric is substantially impermeable to moisture.
Career Highlights
Ken Schatz is currently employed at Intel Corporation, where he continues to develop and refine technologies that enhance semiconductor manufacturing processes. His expertise in sputter etch systems has positioned him as a key player in the field.
Collaborations
Throughout his career, Ken has collaborated with notable colleagues, including Mike Maxim and Jan V Shubert. These partnerships have fostered innovation and contributed to the advancement of technology in their respective areas.
Conclusion
Ken Schatz's contributions to sputter etch technology and semiconductor manufacturing are noteworthy. His patents reflect a commitment to innovation and excellence in the field.