Ken Okutani

Title: Ken Okutani: Innovator in Semiconductor Technology

Introduction

Ken Okutani is a prominent inventor based in Tachikawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the efficiency and reliability of semiconductor integrated circuits.

Latest Patents

One of Okutani's latest patents is a fabrication method for semiconductor integrated circuit devices. This innovation involves forming a low resistance Co silicide layer over the source and drain of a MISFET, optimizing film forming and annealing conditions to reduce leakage current. Specifically, he achieves this by heat treating a Co film deposited at low temperatures, transitioning through various silicide layers to enhance performance.

Another notable patent is related to the metallization structure of semiconductor integrated circuit devices. This method improves contact reliability by forming a plug in a contact hole using a combination of sputtering techniques and CVD deposition. The approach enhances barrier properties, leading to better product yield and reliability.

Career Highlights

Throughout his career, Ken Okutani has worked with leading companies in the semiconductor industry, including Hitachi, Ltd. and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor fabrication.

Collaborations

Okutani has collaborated with notable professionals in the field, including Hiroshi Ashihara and Tatsuyuki Saito. These partnerships have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.

Conclusion

Ken Okutani's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of more efficient and reliable semiconductor devices.