This inventor holds 2 USPTO granted patents. Top assignee: Maxim Integrated Products, Inc.. Active years: 2001-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2005
Title: Ken Liao: Innovator in Semiconductor Technology
Introduction
Ken Liao is a prominent inventor based in Beaverton, OR (US), known for his contributions to semiconductor technology. He holds 2 patents that showcase his innovative approaches to enhancing electronic components. His work focuses on improving the performance and efficiency of transistors and isolation methods in silicon on insulator (SOI) substrates.
Latest Patents
One of Ken Liao's latest patents is titled "Method of forming a super self-aligned hetero-junction bipolar transistor." This invention provides a method for creating a super self-aligned bipolar transistor with enhanced electrical characteristics. The power gain and frequency response of the transistor are improved by horizontally etching an area for the base region that is wider than the active emitter and collector regions. By removing polysilicon layers within the device, the base region resistance decreases, and unwanted capacitive effects are minimized.
Another significant patent is the "Method of forming a shallow and deep trench isolation (SDTI) suitable for silicon on insulator (SOI) substrates." This method includes forming a pair of deep trenches through a silicon on insulator (SOI) layer without substantially disturbing an underlying buried oxide (BOX) layer. After forming the deep trenches, they are filled with suitable electrical isolating materials and etched back to achieve a substantially planarized top surface. This process allows for subsequent steps, including filling the shallow trench, annealing, and chemical-mechanical polishing.
Career Highlights
Ken Liao is currently employed at Maxim Integrated Products, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has significantly impacted the field, particularly in enhancing the performance of electronic devices.
Collaborations
Ken collaborates with notable colleagues, including Alexander Kalnitsky and Robert F Scheer, who contribute to the innovative environment at Maxim Integrated Products, Inc.
Conclusion
Ken Liao's contributions to semiconductor technology through his patents demonstrate his commitment to innovation and excellence in the field. His work continues to influence the development of advanced electronic components, making a lasting impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile