Company Filing History:
Years Active: 2005-2006
Title: Ken Doering: Innovator in Atomic Layer Deposition Technology
Introduction
Ken Doering is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of atomic layer deposition (ALD) and chemical vapor deposition (CVD) technology. With a total of 2 patents, Doering's work focuses on enhancing the efficiency and effectiveness of reactor systems used in various industrial applications.
Latest Patents
One of Ken Doering's latest patents is the "Purged heater-susceptor for an ALD/CVD reactor." This innovative heater assembly provides protection for an electrical conductor associated with a heating element by using a purge gas to isolate the conductor from the corrosive environment of the reactor chamber. The design allows the purge gas to leak into the reactor chamber, which can then be pumped out with the process gases. This arrangement simplifies manufacturing requirements and potentially reduces component costs by eliminating the need for airtight seals at the junction of the sleeve and the heating element.
Another notable patent is the "Massively parallel atomic layer deposition/chemical vapor deposition system." This invention involves a method and apparatus for utilizing individual vertically stacked ALD or CVD reactors. Each reactor is independently operable and maintainable, with gas inlets and outputs configured vertically for generally axi-symmetric process control. The modular chamber design features improved flow design through cover and base plates that form the reactor.
Career Highlights
Ken Doering has established himself as a key figure in the development of advanced reactor technologies. His work at Genus, Inc. has positioned him at the forefront of innovation in the ALD and CVD sectors. His contributions have not only advanced the technology but have also paved the way for more efficient manufacturing processes in various industries.
Collaborations
Throughout his career, Ken has collaborated with notable colleagues, including Thomas E Seidel and Adrian Jansz. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ken Doering's contributions to the field of atomic layer deposition and chemical vapor deposition technology are significant. His innovative patents and collaborative efforts continue to influence the industry, making him a noteworthy inventor in his field.