The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Oct. 29, 2002
Applicants:
Thomas E. Seidel, Sunnyvale, CA (US);
Adrian Jansz, Fremon, CA (US);
Jurek Puchacz, Pleasanton, CA (US);
Ken Doering, San Jose, CA (US);
Inventors:
Thomas E. Seidel, Sunnyvale, CA (US);
Adrian Jansz, Fremon, CA (US);
Jurek Puchacz, Pleasanton, CA (US);
Ken Doering, San Jose, CA (US);
Assignee:
Genus, Inc., Sunnyvale, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C33C016/00 ; C23F001/00 ; H01L021/306 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically configured with respect to the reactor chamber for generally axi-symmetric process control. The chamber design is modular in which cover and base plates forming the reactor have improved flow design.