Company Filing History:
Years Active: 2005
Title: Jurek Puchacz: Innovator in Atomic Layer Deposition Technology
Introduction
Jurek Puchacz is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of atomic layer deposition and chemical vapor deposition systems. His innovative approach has led to advancements in the efficiency and functionality of these technologies.
Latest Patents
Jurek Puchacz holds a patent for a "Massively parallel atomic layer deposition/chemical vapor deposition system." This invention describes a method and apparatus for utilizing individual vertically stacked ALD or CVD reactors. Each reactor is designed to be independently operable and maintainable. The gas inlet and output are vertically configured concerning the reactor chamber, allowing for generally axi-symmetric process control. The modular chamber design features improved flow design through cover and base plates that form the reactor.
Career Highlights
Throughout his career, Jurek has been associated with Genus, Inc., where he has applied his expertise in developing advanced deposition technologies. His work has been instrumental in enhancing the capabilities of the systems used in various applications.
Collaborations
Jurek has collaborated with notable colleagues, including Thomas E Seidel and Adrian Jansz. These partnerships have contributed to the successful development and implementation of innovative technologies in their field.
Conclusion
Jurek Puchacz is a distinguished inventor whose work in atomic layer deposition technology has paved the way for advancements in the industry. His contributions continue to influence the development of efficient and effective deposition systems.