Adrian Jansz

Title: Adrian Jansz: Innovator in Atomic Layer Deposition Technology

Introduction

Adrian Jansz is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of atomic layer deposition and chemical vapor deposition systems. His innovative approach has led to the development of a unique method and apparatus that enhances the efficiency and effectiveness of these processes.

Latest Patents

Adrian holds a patent for a "Massively parallel atomic layer deposition/chemical vapor deposition system." This invention features a method and apparatus for utilizing individual vertically stacked ALD or CVD reactors. Each reactor is designed to be independently operable and maintainable. The gas inlet and output are vertically configured concerning the reactor chamber, allowing for generally axi-symmetric process control. The modular chamber design includes cover and base plates that improve flow design, enhancing overall performance.

Career Highlights

Adrian Jansz has established himself as a key figure in his field through his work at Genus, Inc. His innovative contributions have positioned him as a leader in the development of advanced deposition technologies. His expertise and dedication to research and development have resulted in significant advancements in the industry.

Collaborations

Adrian has collaborated with notable colleagues, including Thomas E. Seidel and Jurek Puchacz. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Adrian Jansz is a pioneering inventor whose work in atomic layer deposition technology has made a lasting impact on the industry. His innovative patent and collaborative efforts highlight his commitment to advancing technology in this field.