Genus, Inc.

Ken Doering

David Keating Foote

Thomas E Seidel

Sasangan Ramanathan

Xinye Liu

Gi Youl Kim

Mike Kubani

Adrian Jansz

Jurek Puchacz

Edward Lee

A heater assembly for an ALD or CVD reactor provides protection for an electrical conductor associated with a heating element by using a purge gas to isolate the conductor from the corrosive environment of the reactor chamber. The purge gas is introduced into a sleeve surrounding the conductor and from there is allowed to leak into the reactor chamber to be pumped out with the process gasses. This arrangement avoids the need for airtight seals at the junction of the sleeve and the heating element easing manufacturing requirements and potentially reducing component costs.

Purged heater-susceptor for an ALD/CVD reactor

A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically configured with respect to the reactor chamber for generally axi-symmetric process control. The chamber design is modular in which cover and base plates forming the reactor have improved flow design.

Massively parallel atomic layer deposition/chemical vapor deposition system

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San Jose, CA, United States of America

Ken Doering