Albany, NY, United States of America

Kelvin Kyaw Zin


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Peabody, MA (US) (2009)
  • Albany, NY (US) (2009 - 2014)

Company Filing History:


Years Active: 2009-2014

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4 patents (USPTO):Explore Patents

Title: Innovations of Kelvin Kyaw Zin

Introduction

Kelvin Kyaw Zin is an accomplished inventor based in Albany, NY (US). He has made significant contributions to the field of plasma processing and etching techniques, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of thin film processing.

Latest Patents

Kelvin's latest patents include a method of etching a thin film using pressure modulation. This innovative method describes how to transfer a feature pattern to a thin film on a substrate. It involves disposing a substrate with one or more mask layers over a thin film in a plasma processing system. The process includes forming a feature pattern in the mask layers and transferring it to the thin film through a two-step plasma etching process at varying pressures.

Another notable patent is the method of pattern etching a dielectric film while removing a mask layer. This method outlines the preparation of a film stack on a substrate, which consists of a dielectric layer and a mask layer. A pattern is created in the mask layer, and the pattern is subsequently transferred to the dielectric layer using a plasma etching process. This process effectively removes the mask layer while transferring the pattern, utilizing a specific process gas composition to achieve the desired etching rates.

Career Highlights

Kelvin Kyaw Zin is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His expertise in plasma processing has positioned him as a valuable asset to the company, contributing to advancements in technology and innovation.

Collaborations

Kelvin has collaborated with notable colleagues such as Masaru Nishino and Chong Hwan Chu. Their combined efforts in research and development have led to significant advancements in the field of semiconductor processing.

Conclusion

Kelvin Kyaw Zin's innovative work in plasma processing and etching techniques has made a substantial impact on the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.

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