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Kanagawa, Japan

Keisuke Tsudaka

This inventor holds 12 USPTO granted patents and 1 published patent application. Top assignee: Sony Corporation. Active years: 1996-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keisuke Tsudaka. Retrieved from https://idiyas.com/inventor/keisuke-tsudaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 12 (Patent Applications = 1)

% Patents Active = 100.0

Average Co-Inventor Count = 1.1

ph-index = 9

Forward Citations = 334(Granted Patents)

Company Filing History:

12 out of 58,148

Sony Corporation

Years Active: 1996-2001

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6249597 - Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same (2001-06-19),

2. 6154563 - Method of correcting mask pattern and mask, method of exposure, (2000-11-28),

3. 6067375 - Correction method and correction apparatus of mask pattern (2000-05-23),

4. 6058203 - Correction method and correction apparatus of mask pattern (2000-05-02),

5. 6042257 - Correction method and correction apparatus of mask pattern (2000-03-28),

6. 6014456 - Method of correcting mask pattern and mask, method of exposure, (2000-01-11),

7. 5991006 - Method and apparatus for correcting exposure patterns, and exposure (1999-11-23),

8. 5969801 - Correction method and correction apparatus of mask pattern (1999-10-19),

9. 5825647 - Correction method and correction apparatus of mask pattern (1998-10-20),

10. 5736280 - Method of estimation of resist pattern and method of exposure based on (1998-04-07),

11. 5723235 - Method of producing photomask and exposing (1998-03-03),

12. 5558963 - Method of producing photomask and exposing (1996-09-24),

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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