Keisuke Okushiro

Title: Keisuke Okushiro: Innovator in Stereolithography and Olefinic Resin Compositions

Introduction

Keisuke Okushiro is a notable inventor based in Kyoto, Japan. He has made significant contributions to the fields of stereolithography and material science. With a total of 2 patents to his name, Okushiro's work focuses on innovative compositions that enhance manufacturing processes.

Latest Patents

Okushiro's latest patents include a "Composition for Support Material" and an "Ink Set for Stereolithography." The support material composition is designed to support model materials used in ink-jet stereolithography. It contains polyalkylene glycol with an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator. The formulation specifies that the polyalkylene glycol should comprise between 15 and 75 parts by mass of the total composition. His second patent, the "Olefinic Resin Composition and Molded Article," describes a composition that includes an olefinic resin and various inorganic particles. This composition is characterized by its low friction coefficient and high mechanical strength, making it suitable for manufacturing sliding members like tape guides.

Career Highlights

Throughout his career, Okushiro has worked with prominent companies such as Hitachi Maxell, Limited and Maxell Holdings, Ltd. His experience in these organizations has allowed him to refine his expertise in material development and innovation.

Collaborations

Okushiro has collaborated with notable colleagues, including Tatsuo Araki and Hiroshi Ota. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Keisuke Okushiro's contributions to the fields of stereolithography and material science highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes and material properties.