Hitachi Maxell, Limited

Maxell Holdings, Ltd.

Keisuke Okushiro

Tatsuo Araki

Hiroshi Ota

A composition for a support material according to the present invention is to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography and contains polyalkylene glycol having an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator, and the content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.

Composition for support material and ink set for stereolithography

An olefinic resin composition for molding, which comprises an olefinic resin, inorganic particles in rod shape and inorganic particles of planar crystalline structure respectively in 10 to 90% by volume, 3 to 60% by volume and 5 to 55% by volume based on the composition. A molded article made of such a composition is low in friction coefficient and high in mechanical strength. When this composition is incorporated with a synthetic resin having a higher hardness than the olefinic resin, the resultant molded article is enhanced in endurance on sliding. The resulting composition is suitable for manufacturing of a sliding member such as a tape guide.

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Kyoto, Japan

Keisuke Okushiro