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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10557032 B1

PDFFull Text
Expired
Date of Patent:
Feb. 11, 2020

Filed:

Nov. 29, 2017

Composition for support material and ink set for stereolithography

Applicant:

Maxell Holdings, Ltd., Otokuni-gen, Kyoto, JP;

Inventors:

Hiroshi Ota, Kyoto, JP;

Keisuke Okushiro, Kyoto, JP;

Assignee:

MAXELL HOLDINGS, LTD., Kyoto, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Jessica Whiteley

Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); C08L 33/26 (2006.01); C08F 20/58 (2006.01); B33Y 70/00 (2015.01); C09D 11/101 (2014.01); C09D 11/30 (2014.01);
U.S. Cl.
CPC ...
C08L 33/26 (2013.01); B33Y 70/00 (2014.12); C08F 20/58 (2013.01); C09D 11/101 (2013.01); C09D 11/30 (2013.01);
Abstract

A composition for a support material according to the present invention is to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography and contains polyalkylene glycol having an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator, and the content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.

Find Patent Forward Citations

Ota, Hiroshi. (2020). Composition for support material and ink set for stereolithography (U.S. Patent No. 10557032). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10557032

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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