Tokyo, Japan

Keisuke Hanashima

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Tokyo, JP (2019 - 2023)
  • Chiyoda-ku, JP (2020 - 2024)

Company Filing History:


Years Active: 2019-2024

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8 patents (USPTO):Explore Patents

Title: Keisuke Hanashima: Innovator in Glass Substrate Manufacturing

Introduction

Keisuke Hanashima is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of glass substrate manufacturing, holding a total of eight patents. His innovative approaches have advanced the technology used in supporting semiconductor devices.

Latest Patents

Among his latest patents is a manufacturing method for glass substrates designed to suppress the lowering of dimensional accuracy. This method involves generating a glass base plate, measuring its thickness, thickness deviation, and warpage amount. The process includes screening the glass base plate based on its thickness, generating multiple glass blanks, and setting specific polishing conditions to ensure high-quality glass substrates. The final product is a rectangular glass substrate with precise dimensions, crucial for semiconductor applications.

Career Highlights

Keisuke Hanashima has established himself as a key figure at AGC Inc., where he continues to innovate in glass manufacturing techniques. His work has not only improved the quality of glass substrates but has also contributed to the efficiency of semiconductor device production.

Collaborations

He collaborates with talented coworkers such as Yu Hanawa and Shuhei Nomura, who share his commitment to advancing glass technology. Their teamwork has led to the successful development of new manufacturing methods and products.

Conclusion

Keisuke Hanashima's contributions to glass substrate manufacturing exemplify the spirit of innovation in the technology sector. His patents and collaborative efforts continue to shape the future of semiconductor device support.

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