Tokyo, Japan

Keishi Tsukiyama

USPTO Granted Patents = 3 

Average Co-Inventor Count = 6.8

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Keishi Tsukiyama: Innovator in EUV Lithography

Introduction

Keishi Tsukiyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, a critical technology in semiconductor manufacturing. With a total of three patents to his name, Tsukiyama's work focuses on enhancing the efficiency and effectiveness of reflective masks used in this advanced lithography process.

Latest Patents

Tsukiyama's latest patents include innovative designs for reflective mask blanks and methods for manufacturing them. His first patent describes a reflective mask blank for EUV lithography, which consists of a substrate, a multilayer reflective film that reflects EUV light, and a phase shift film that alters the phase of the EUV light. This phase shift film incorporates a layer containing ruthenium (Ru) and nitrogen (N), with a film stress of 1,000 MPa or less. His second patent focuses on a reflective mask blank that includes a substrate, a multilayered reflection film, a protection film, and an absorption film, all arranged in a specific order. The protection film is primarily composed of rhodium (Rh), while the multilayered reflection film features an uppermost layer containing silicon (Si) and nitrogen (N), with specific element ratios.

Career Highlights

Tsukiyama is currently employed at AGC Inc., a leading company in the glass and chemical industry. His work at AGC Inc. has allowed him to collaborate with other talented professionals in the field, further advancing the technology of EUV lithography.

Collaborations

Some of Tsukiyama's notable coworkers include Daijiro Akagi and Toshiyuki Uno. Their collaborative efforts contribute to the innovative projects at AGC Inc., enhancing the company's capabilities in semiconductor manufacturing technologies.

Conclusion

Keishi Tsukiyama is a key figure in the development of EUV lithography technologies. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing. Through his work at AGC Inc. and collaborations with fellow inventors, Tsukiyama continues to push the boundaries of innovation in this critical field.

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