Ibaraki, Japan

Keishi Saitoh


Average Co-Inventor Count = 3.6

ph-index = 15

Forward Citations = 840(Granted Patents)

Forward Citations (Not Self Cited) = 733(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Yokohama, JP (1984)
  • Shimomaruko, Ohta-ku, Tokyo, JP (1985 - 1987)
  • Ibaraki, JP (1985 - 1988)
  • Tokyo, JP (1983 - 1989)
  • Nabari, JP (1989 - 1990)
  • Nara, JP (1996 - 1997)
  • Nagahama, JP (1988 - 1998)

Company Filing History:


Years Active: 1983-1998

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Areas of Expertise:
Microwave Plasma CVD
Photovoltaic Devices
Amorphous Silicon
Electrophotography
Semiconductor Devices
Deposited Film Formation
Photoconductive Members
Light Receiving Members
Functional Deposited Films
Electroluminescent Devices
Chemical Vapor Deposition
Layered Photoconductive Elements
90 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Keishi Saitoh

Introduction

Keishi Saitoh, an esteemed inventor based in Ibaraki, Japan, has made significant strides in the field of technology and engineering, showcasing his exceptional talent with a remarkable portfolio of 90 patents. His contributions primarily focus on advancements in materials, specifically related to silicon-based technologies.

Latest Patents

Among his latest innovations, Saitoh has developed a sophisticated light receiving member incorporating a non-single-crystal silicon layer. Additionally, he has pioneered a microwave plasma chemical vapor deposition process, including a unique apparatus designed for creating functional deposited films on substrates. This advanced apparatus features a hermetically sealed film-forming chamber complete with a microwave introducing window and a movable dielectric sheet that enhances the film deposition process.

Career Highlights

Throughout his career, Keishi Saitoh has collaborated with notable companies such as Canon Kabushiki Kaisha, where he contributed to various groundbreaking technologies. His role has consistently focused on advancing the capabilities of semiconductor materials and deposition processes, securing his reputation as an influential figure in his field.

Collaborations

In his professional journey, Saitoh has worked alongside esteemed colleagues, including Kyosuke Ogawa and Teruo Misumi. Their collaboration has likely facilitated the innovative developments and patent filings that Saitoh has achieved, reflecting a strong synergy among talented engineers and inventors.

Conclusion

Keishi Saitoh stands as a prominent inventor whose work continues to impact technology and materials science. With a robust portfolio of patents and a rich history of collaboration with industry leaders, he exemplifies the spirit of innovation and the drive to push technological boundaries. His contributions will undoubtedly influence future advancements in technology, maintaining the momentum of innovation in his field.

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