Ibaraki, Japan

Keishi Saitoh

This inventor holds 90 USPTO granted patents, primarily in Thin Film Technology (CPC class 430 84). Top assignees: Canon Kabushiki Kaisha, Other. Active years: 1983-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keishi Saitoh. Retrieved from https://idiyas.com/inventor/keishi-saitoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 15

Forward Citations = 840(Granted Patents)

Forward Citations (Not Self Cited) = 733(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Yokohama, JP (1984)
  • Shimomaruko, Ohta-ku, Tokyo, JP (1985 - 1987)
  • Ibaraki, JP (1985 - 1988)
  • Tokyo, JP (1983 - 1989)
  • Nabari, JP (1989 - 1990)
  • Nara, JP (1996 - 1997)
  • Nagahama, JP (1988 - 1998)

Company Filing History:


Years Active: 1983-1998

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Areas of Expertise:
Photovoltaic Devices
Microwave Plasma CVD
Thin Film Formation
Electrophotography
Amorphous Silicon
Semiconductor Production
Deposited Films
Light Receiving Members
Functional Films
Chemical Vapor Deposition
Electroluminescent Devices
90 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Keishi Saitoh

Introduction

Keishi Saitoh, an esteemed inventor based in Ibaraki, Japan, has made significant strides in the field of technology and engineering, showcasing his exceptional talent with a remarkable portfolio of 90 patents. His contributions primarily focus on advancements in materials, specifically related to silicon-based technologies.

Latest Patents

Among his latest innovations, Saitoh has developed a sophisticated light receiving member incorporating a non-single-crystal silicon layer. Additionally, he has pioneered a microwave plasma chemical vapor deposition process, including a unique apparatus designed for creating functional deposited films on substrates. This advanced apparatus features a hermetically sealed film-forming chamber complete with a microwave introducing window and a movable dielectric sheet that enhances the film deposition process.

Career Highlights

Throughout his career, Keishi Saitoh has collaborated with notable companies such as Canon Kabushiki Kaisha, where he contributed to various groundbreaking technologies. His role has consistently focused on advancing the capabilities of semiconductor materials and deposition processes, securing his reputation as an influential figure in his field.

Collaborations

In his professional journey, Saitoh has worked alongside esteemed colleagues, including Kyosuke Ogawa and Teruo Misumi. Their collaboration has likely facilitated the innovative developments and patent filings that Saitoh has achieved, reflecting a strong synergy among talented engineers and inventors.

Conclusion

Keishi Saitoh stands as a prominent inventor whose work continues to impact technology and materials science. With a robust portfolio of patents and a rich history of collaboration with industry leaders, he exemplifies the spirit of innovation and the drive to push technological boundaries. His contributions will undoubtedly influence future advancements in technology, maintaining the momentum of innovation in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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