Location History:
- Ebina, JP (1988 - 2000)
- Fukaya, JP (2003)
Company Filing History:
Years Active: 1988-2003
Title: Keisaku Yamada: Innovator in Semiconductor Technology
Introduction
Keisaku Yamada is a prominent inventor based in Ebina, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative approaches have paved the way for advancements in material science and semiconductor manufacturing processes.
Latest Patents
One of Yamada's latest patents is a copper film selective formation method. This method is designed to reduce material costs by selectively depositing copper in necessary regions of an undercoat film made from various materials, including metals and insulators. The process involves forming a thin film of a silane coupling agent or surfactant on the undercoat film, making the prospective copper film region hydrophilic, and then selectively forming a copper film in that region through chemical vapor deposition (CVD).
Another notable patent is a method of preparing a semiconductor work surface. This method includes forming a silicon monocrystalline substrate, removing a silicon oxide film via wet etching, and washing the work surface with pure water that has a low dissolved oxygen concentration. The work surface is oriented at a specific angle to enhance the etching process, allowing for the preferential exposure of certain crystal planes.
Career Highlights
Keisaku Yamada is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Yamada has collaborated with notable colleagues, including Yoshitaka Tsunashima and Takako Kashio. Their combined expertise has contributed to the successful development of various technologies in the semiconductor field.
Conclusion
Keisaku Yamada's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the field. His work not only enhances manufacturing processes but also sets the stage for future innovations in the industry.