Location History:
- Hyogo, JP (1990)
- Kobe, JP (1991 - 1993)
Company Filing History:
Years Active: 1990-1993
Title: Keiko Miki: Innovator in Amorphous Semiconductors
Introduction
Keiko Miki is a prominent inventor based in Kobe, Japan. She has made significant contributions to the field of semiconductor technology, particularly in the development of amorphous semiconductors. With a total of 3 patents to her name, her work has implications for various applications, including solar cells and thin film transistors.
Latest Patents
One of her latest patents focuses on an amorphous semiconductor device that utilizes hydrogen. This invention involves exposing an amorphous semiconductor thin film to an atmosphere of hydrogen radicals during or after its formation. Additionally, the thin film can be subjected to light irradiation with a density of not less than 10 W/cm² at wavelengths between 300 to 700 nm. This process results in a thin film that exhibits improved resistance to photo deterioration. Another notable patent is for a color sensor that incorporates laminated semiconductor layers, showcasing her innovative approach to semiconductor design.
Career Highlights
Throughout her career, Keiko Miki has worked with notable companies such as Kanegafuchi Kagaku Kogyo Kabushiki Kaisha and Kanegafuchi Chemical Industry Co., Ltd. Her experience in these organizations has allowed her to refine her expertise in semiconductor technology and contribute to groundbreaking advancements in the field.
Collaborations
Keiko has collaborated with esteemed colleagues, including Hideo Yamagishi and Hitoshi Nishio. These partnerships have fostered a creative environment that has led to the development of her innovative patents.
Conclusion
Keiko Miki's contributions to the field of amorphous semiconductors highlight her role as a leading inventor in Japan. Her patents not only advance technology but also pave the way for future innovations in semiconductor applications.