Location History:
- Machida, JP (1987 - 1989)
- Tokyo, JP (1989)
Company Filing History:
Years Active: 1987-1989
Title: Keiko Matsuda: Innovator in Lithography Technology
Introduction
Keiko Matsuda is a prominent inventor based in Machida, Japan. She has made significant contributions to the field of lithography, particularly in the development of mask structures. With a total of 3 patents to her name, Matsuda has established herself as a key figure in her industry.
Latest Patents
Matsuda's latest patents include innovative technologies that enhance lithographic processes. One of her notable inventions is a mask structure for lithography, which features a mask material holding a thin film and a holding substrate designed to support the peripheral portion of the mask material. This mask material comprises a film made of aluminum, nitrogen, and oxygen. Another significant patent is a lithographic mask structure that includes a mask support film and a support substrate, where the peripheral portion of the mask support film is attached to the surface of the support substrate, which has a groove.
Career Highlights
Keiko Matsuda is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. Her work at Canon has allowed her to focus on advancing lithographic techniques, contributing to the company's reputation for innovation.
Collaborations
Matsuda has collaborated with notable colleagues in her field, including Hideo Kato and Masaaki Matsushima. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and technological advancements.
Conclusion
Keiko Matsuda's contributions to lithography technology through her patents and work at Canon Kabushiki Kaisha highlight her role as an influential inventor. Her innovative spirit continues to drive advancements in the industry, making her a significant figure in the world of technology.