The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 1987

Filed:

Nov. 01, 1985
Applicant:
Inventors:

Hideo Kato, Yokohama, JP;

Masaaki Matsushima, Yokohama, JP;

Keiko Matsuda, Machida, JP;

Hirofumi Shibata, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ; 430967 ; 428698 ; 428446 ; 4284735 ; 428480 ; 428500 ; 378 34 ; 378 35 ;
Abstract

A mask structure for lithography has a ring frame holding the peripheral portion of a thin film for holding a mask material, the mask material holding thin film comprising a layer of aluminum nitride.


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