The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1989
Filed:
Mar. 14, 1988
Applicant:
Inventors:
Hideo Kato, Yokohama, JP;
Masaaki Matsushima, Yokohama, JP;
Keiko Matsuda, Machida, JP;
Hirofumi Shibata, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430269 ; 430-5 ; 430321 ; 430322 ; 428698 ; 428702 ;
Abstract
A mask structure for lithography has a mask material holding thin film and a holding substrate for holding the peripheral portion of said mask material holding thin film, said mask material holding thin film comprising a film comprising aluminum, nitrogen and oxygen.
Kato, Hideo. (1989). Mask structure for lithography, method of preparation thereof and (U.S. Patent No. 4837123). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4837123
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile