The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 1989

Filed:

Feb. 01, 1988
Applicant:
Inventors:

Hideo Kato, Yokohama, JP;

Hirofumi Shibatya, Yokohama, JP;

Keiko Matsuda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G21K / ;
U.S. Cl.
CPC ...
430-5 ; 378 34 ; 378 35 ;
Abstract

There is disclosed a lithographic mask structure including a mask support film, and a support substrate, wherein the peripheral portion of the mask support film is attached on the surface of the support substrate which has a groove.


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