This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: Hirofumi Shibatya: Innovator in Lithographic Mask Technology.
Introduction
Hirofumi Shibatya is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of lithography, particularly through his innovative patent related to mask structures.
Latest Patents
Hirofumi Shibatya holds a patent for a lithographic mask structure and the process for preparing the same. This patent describes a lithographic mask structure that includes a mask support film and a support substrate. The design features a peripheral portion of the mask support film that is attached to the surface of the support substrate, which has a groove. This innovation is crucial for enhancing the precision and efficiency of lithographic processes.
Career Highlights
Hirofumi Shibatya is associated with Canon Inc., a leading company in imaging and printing technologies. His work at Canon has allowed him to focus on advancing lithographic techniques, contributing to the company's reputation for innovation in the industry.
Collaborations
Hirofumi has collaborated with notable colleagues such as Hideo Kato and Keiko Matsuda. Their combined expertise has fostered a productive environment for innovation and development within their projects.
Conclusion
Hirofumi Shibatya's contributions to lithographic mask technology exemplify the impact of innovative thinking in the field. His patent and work at Canon Inc. highlight the importance of collaboration and creativity in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile