Company Filing History:
Years Active: 1989-1992
Title: Keiji Sawaya: Innovator in Semiconductor Technology
Introduction
Keiji Sawaya is a prominent inventor based in Sapporo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the formation of polycrystalline silicon layers. With a total of two patents to his name, Sawaya's work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Sawaya's latest patents include a method of forming a polycrystalline silicon layer on a semiconductor wafer. This innovative method involves several steps, including placing semiconductor wafers in recesses on a mold body, creating a mold, and rotating it in a heating inert gas. The process maintains wafer temperatures between 1300°C and 1350°C, allowing for the pouring of heated melted silicon into the mold. This method enables the formation of an accumulated layer of 100 microns at high speed and with economic efficiency. His second patent involves a polycrystalline silicon wafer tray, which utilizes centrifugal force to flow molten silicon base material, forming a thin molten material layer. This design allows for the simultaneous formation of wafers without surface projections.
Career Highlights
Keiji Sawaya is associated with Hoxan Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in improving manufacturing processes and enhancing product quality in the industry.
Collaborations
Some of Sawaya's notable coworkers include Takashi Yokoyama and Ichiro Hide. Their collaborative efforts contribute to the advancement of technology within their field.
Conclusion
Keiji Sawaya's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the efficiency of semiconductor manufacturing processes.