Miyagi, Japan

Keiichi Shimoda


 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Miyagi, JP (2017 - 2021)
  • Beaverton, OR (US) (2019 - 2021)

Company Filing History:


Years Active: 2017-2021

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6 patents (USPTO):Explore Patents

Title: Innovations by Keiichi Shimoda

Introduction

Keiichi Shimoda is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of six patents. His work focuses on methods that enhance the efficiency and effectiveness of cleaning processes in substrate and plasma processing apparatuses.

Latest Patents

One of his latest patents is a method of cleaning a plasma processing apparatus. This innovative method involves removing a first deposit formed on an upper electrode through etching a metal layer. The process utilizes plasma generated between a lower electrode and the upper electrode within a processing chamber. The method includes colliding ions with the first deposit and subsequently removing a second deposit generated from this collision. This cycle is repeated multiple times to ensure thorough cleaning. Another notable patent is a method of cleaning a substrate processing apparatus that etches a film containing metal. This method involves using an inert gas to remove metal-containing deposits and subsequently employing a gas containing fluorine and oxygen to eliminate silicon-containing deposits.

Career Highlights

Keiichi Shimoda has established himself as a key figure in the field of plasma processing technology. His innovative approaches have led to advancements in cleaning methods that are crucial for maintaining the efficiency of processing apparatuses. His work is recognized for its practical applications in the semiconductor industry.

Collaborations

Throughout his career, Keiichi has collaborated with notable colleagues, including Eiichi Nishimura and Mitsuru Hashimoto. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Keiichi Shimoda's contributions to plasma processing technology through his innovative patents have significantly impacted the industry. His methods for cleaning processing apparatuses demonstrate his commitment to advancing technology and improving efficiency in semiconductor manufacturing.

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