Kanagawa-ken, Japan

Kei Yoshikawa


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Yokohama, JP (2008 - 2010)
  • Kanagawa-ken, JP (2007 - 2012)

Company Filing History:


Years Active: 2007-2012

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7 patents (USPTO):Explore Patents

Title: **Inventor Kei Yoshikawa: Pioneering Innovations in Semiconductor Technology**

Introduction

Kei Yoshikawa, a prominent inventor based in Kanagawa-ken, Japan, has made significant contributions to the field of semiconductor technology. With a total of seven patents to his name, he continues to push the boundaries of innovation in his domain.

Latest Patents

Among his latest patents is a method for semiconductor device fabrication employing multiple mask patterns. This intricate process involves forming a resist pattern over a hard mask material film situated above a work film. It details the transformation of the material film through selective processing using the resist pattern as a mask. The evolution of the hard mask pattern is carefully orchestrated to produce a resist pattern over a non-selected region, which features an opening for exposing a selection region within the mask pattern. A unique selection etching technique is applied, allowing the etching of the work film based on the modified mask pattern. This culminates in the formation of a work film pattern that includes both a wide pattern section compliant with the exposure resolution and a slimmed pattern, which remains within the resolution limitation.

Another notable patent by Yoshikawa is similar in theme and complexity, emphasizing the advanced techniques required in the semiconductor industry. His work has evidently led to substantial improvements in the fabrication methodologies of semiconductors.

Career Highlights

Currently, Kei Yoshikawa is affiliated with Kabushiki Kaisha Toshiba, a renowned company known for its groundbreaking developments in technology. Throughout his career, he has demonstrated exceptional expertise in semiconductor technologies, contributing to the industry's advancements.

Collaborations

Yoshikawa works alongside esteemed colleagues such as Koji Hashimoto and Soichi Inoue, enriching his projects with collaborative expertise. These partnerships have fostered a conducive environment for innovation, enabling the team to tackle complex challenges in semiconductor development.

Conclusion

Kei Yoshikawa's achievements in semiconductor technology reflect his commitment to innovation. With numerous patents securing his contributions, his work at Kabushiki Kaisha Toshiba and collaborations with talented coworkers underscore a promising future for advancements in the semiconductor field.

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