Shanghai, China

Ke Lan


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Ke Lan - Innovator in Exposure Systems and Devices

Introduction

Ke Lan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of exposure systems and devices, holding a total of 2 patents. His innovative work focuses on improving processing adaptability and reducing costs in various applications.

Latest Patents

Ke Lan's latest patents include an exposure system, an exposure device, and an exposure method. The exposure system comprises a laser unit, a light spot switching unit, and a lens unit. The laser unit is designed to produce a laser beam, while the light spot switching unit directs the laser beam along different optical paths based on the desired size of a light spot for a workpiece. This allows for the formation of light spots sized in different ranges, catering to various critical dimensions of workpieces. The lens unit alters the direction of the laser beam incident on the workpiece, enhancing processing adaptability and significantly reducing costs.

Another notable patent is the focusing and leveling device, which calculates the amount of defocus and/or tilt of a substrate. This device includes an illumination unit, a projection-side mark plate, a projection-side imaging group, a deflection prism, a beam splitter, a detection unit, and a signal processing unit. The light beam emitted from the illumination unit is directed onto the substrate surface, and the system calculates the defocus and tilt based on measurements detected by the detection unit.

Career Highlights

Ke Lan is currently employed at Shanghai Micro Electronics Equipment (Group) Co., Ltd. His work at this company has allowed him to develop cutting-edge technologies that enhance the efficiency and effectiveness of exposure systems.

Collaborations

Ke Lan collaborates with talented coworkers, including Yaping Ge and Yonghui Chen. Their combined expertise contributes to the innovative projects undertaken at their company.

Conclusion

Ke Lan is a distinguished inventor whose work in exposure systems and devices has made a significant impact in the field. His patents reflect a commitment to innovation and efficiency, showcasing his role as a leader in technological advancements.

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