Shanghai Micro Electronics Equipment (Group) Co., Ltd.

Ke Lan

Yaping Ge

Yonghui Chen

Shihua Wang

An exposure system (), an exposure apparatus and an exposure method are disclosed. The exposure system () includes: a laser unit (), a light spot switching unit () and a lens unit (); the laser unit () is configured for producing a laser beam; the light spot switching unit () is configured to direct the laser beam to travel along one of different optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained; and the lens unit () is configured for altering a direction in which the laser beam is incident on the workpiece. The light spot switching unit () enables the laser beam to be switched between the different optical paths so as to form light spots sized in different ranges, which can satisfy different needs of workpieces with various critical dimensions. As a result, an improvement in processing adaptability to different workpieces and a significant reduction in cost can be achieved.

Exposure system, exposure device and exposure method

A focusing and leveling device calculates an amount of defocus and/or tilt of a substrate and includes an illumination unit, projection-side mark plate with projection-side slit mark, projection-side imaging group, deflection prism, beam splitter, detection unit and signal processing unit. A light beam emitted from the illumination unit passes through the projection-side mark plate and is trimmed into a probe beam directed by the projection-side imaging group onto a substrate surface. The prism deflects the probe beam reflected by the surface of the substrate for a first time so that it is incident on the substrate surface and reflected for a second time onto the projection-side imaging group. The beam splitter directs the probe beam that travelled through the projection-side imaging group onto the detection unit. The signal processing unit calculates the amount of defocus and/or tilt based on a measurement spot detected by the detection unit.

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Shanghai, China

Ke Lan