Ke Chang

Title: Ke Chang: Innovator in Extreme Ultraviolet Lithography

Introduction

Ke Chang is a prominent inventor based in Singapore, known for his significant contributions to the field of semiconductor manufacturing. With a total of 5 patents, he has made remarkable advancements in the technology surrounding extreme ultraviolet (EUV) lithography.

Latest Patents

One of his latest patents focuses on "Extreme ultraviolet mask blank defect reduction." This patent discloses methods for the manufacture of EUV mask blanks and the production systems associated with them. The method involves placing a substrate in a multi-cathode physical vapor deposition chamber, which contains at least three targets, including a first molybdenum target adjacent to a silicon target. Another notable patent is related to the "Method for forming a layer," which pertains to the fabrication of integrated circuits. This method describes the formation of a mask used in the lithography process to pattern and create trenches, enhancing the electrical paths by selectively depositing materials.

Career Highlights

Ke Chang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in pushing the boundaries of EUV technology, which is critical for the production of advanced microchips.

Collaborations

Throughout his career, Ke Chang has collaborated with notable colleagues, including Loke Yuen Wong and Yueh Sheng Ow. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

Ke Chang's contributions to the field of semiconductor manufacturing, particularly in EUV lithography, highlight his role as a key innovator. His patents and collaborations continue to influence the industry, paving the way for future advancements in technology.