This inventor holds 7 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignees: Tokyo Electron Limited, Fujikin Inc.. Active years: 2004-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Nirasaki, JP (2004 - 2015)
- Miyagi, JP (2020)
- Yamanashi, JP (2022)
Company Filing History:


Years Active: 2004-2022
Title: Kazuyuki Tezuka: Innovator in Maintenance Devices and Processing Methods
Introduction
Kazuyuki Tezuka is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of maintenance devices and processing methods, holding a total of seven patents. His innovative work has impacted various industries, particularly in substrate processing.
Latest Patents
Tezuka's latest patents include a maintenance device designed to operate in a vacuum atmosphere during substrate processing. This device features a cover that corresponds to the boundary line between two parts of a processing container, ensuring airtightness and visual transparency. Additionally, he has developed a processing method that involves a gas discharge unit with multiple spaces for discharging different gases. This method allows for the switching of gases without mixing them, enhancing the efficiency of the processing chamber.
Career Highlights
Throughout his career, Kazuyuki Tezuka has worked with prominent companies such as Tokyo Electron Limited and Fujikin Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in his field.
Collaborations
Tezuka has collaborated with notable coworkers, including Takashi Kitazawa and Hiroshi Koizumi. These partnerships have fostered a creative environment that has led to the development of advanced technologies.
Conclusion
Kazuyuki Tezuka's contributions to maintenance devices and processing methods exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving efficiency and effectiveness in substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile