This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 2013-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013-2014
Title: Kazuyoshi Yaguchi: Semiconductor and Silicon Etching Innovations.
Introduction
Kazuyoshi Yaguchi is an inventor based in Tokyo, Japan, whose patent work focuses on etching technologies for silicon and metallic materials used in semiconductor manufacturing. He is associated with Mitsubishi Gas Chemical Company, Inc. His portfolio includes 3 patents.
Latest Patents
Yaguchi’s listed patents address etching processes relevant to semiconductor devices and MEMS manufacturing.
“Silicon Etching Liquid and Etching Method” describes an aqueous etching liquid containing a quaternary ammonium hydroxide and an aminoguanidine salt. The composition anisotropically dissolves monocrystalline silicon and is intended to support high-rate processing, including in the manufacture of MEMS parts and semiconductor devices.
“Etching Composition for Metal Material and Method for Manufacturing Semiconductor Device by Using Same” concerns an aqueous etchant for selectively etching metallic materials. The disclosed composition contains a fluorine compound and a chelating agent with a phosphorus oxo-acid functional group, with inorganic and/or organic acids included in some formulations. The patent also describes using the composition in semiconductor-device production.
Career Highlights
Yaguchi’s patent work reflects a focus on chemical compositions and methods for controlled material removal. His inventions address silicon and metal etching, processes that can contribute to manufacturing semiconductor devices and MEMS components.
Collaborations
Yaguchi is associated with Mitsubishi Gas Chemical Company, Inc. His listed coworkers include Ryuji Sotoaka and Kojiro Abe.
Conclusion
Kazuyoshi Yaguchi’s patents highlight etching innovations designed for semiconductor and MEMS manufacturing, with particular attention to silicon processing and selective metal etching.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
